Working draft
ISO/WD 19383
Atomic Layer Deposition-- Chemical characteristics and related process specifications of atomic layer deposition precursors
Reference number
ISO/WD 19383
Edition 1
Working draft
ISO/WD 19383
89126
A working group has prepared a draft.

Abstract

This document describes the chemical characteristics and related process specifications of the atomic layer deposition precursors, including assay content, metal purity, and anion content specification.

General information

  •  : Under development
    : Close of comment period [20.60]
  •  : 1
  • ISO/TC 107
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